Used by Russian University to make obsidian or create. new sources presented in EUV lithography. Unlike existing domestic solutions, it is characterized by increased efficiency due to the addition of lithium to the helium plasma charge.
However, the artist appears in a video of experimental work, and mass-stable studies of lithium helium plasma discharge have not been carried out, allowing the creation of stationary devices tested using EUV lithography.
In the case of large-scale production of chips and monocrystalline systems for technological breakthroughs, the process significantly reduces their size, and also increases speed and insufficient energy efficiency.
At the moment they are planning a promising prototype and work is underway to create Russian lithographs based on this source do.
Source: Tech Cult
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