On the Web, information has already appeared that in Russia work is underway on a lithographic installation capable of producing 7-nm microcircuits, and even for the first time about the first samples of semiconductors, and now new data have appeared on the development in this installation.
According to the scientific director of the NTsFM, Alexander Sergeev, who became the leader at the Atomexpo 2022 exhibition that ended today, three domestic achievements will be based on Russian lithographic equipment.
In an example that needs to be guided and bypassed, Sergeev cited a lithograph from ASML with model number NXE: 3400B, which has a 13.5-nanometer waveform. The principle of operation of this method is to use a laser dropper made of tin, ultimately, as far as the plasma is concerned.
As for the “three achievements” – this is the active development of a high-power scanner, preparation for the use of the working fluid, which differs from the use in ASML olova machines than the RFNC-VNIIEF specialists now, as well as the development of images of mirrors for focus – work is being done on them IAP RAS, as well as the Federal Nuclear Center (Sarov).
According to Sergeev, the joint aggregation of development volumes with the expert of the NCFM and the area of support from Rosatom, in the next 2-3 years, will make it possible to build Russian lithographic equipment with a power that will be many times greater than that of ASML, and the wavelength will be the same – 13 ,5 nm.
Source: Tech Cult
