This cutting-edge tool will be used for research and development of next-generation process technologies. Samsung’s High-NA EUV system is expected to be operational in mid-2025, putting the company ahead of competitors TSMC and SK hynix. The technology is critical to the development of 8nm chip fabrication, which is significantly superior to current Low-NA EUV systems that reach 13nm.
Samsung is also developing a comprehensive ecosystem around the technology, partnering with Lasertec for mask testing, JSR for photoresists, Tokyo Electron for engraving machines, and Synopsys for design tools.
High NA EUV systems range in price from $380 million to $400 million.
Source: Ferra
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