The installation uses the molecular beam epitaxi method that requires a high ultra vacuum to form atomic thin layers of the material. On earth, such equipment is characterized by large dimensions and high costs. Cosmic vacuum allows you to simplify the process to a great extent and use a single camera for all items.
The experiment aims to examine the effectiveness of the growth of semiconductor layers in orbit conditions. Scientists will analyze the properties of the materials obtained and solve technological processes. This is the first project that conducts molecular beam epitaxes in space.
The equipment has been specially developed, taking into account field restrictions: small weight, radiation resistance and characteristics of the behavior of materials in zero gravity.
Source: Ferra
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